Pt Single Atom Deposition by Direct Current Sputtering in the Gas‐Scattering Regime—A Simple Approach to Controlled Single Atom Loading

Highly controlled Pt single atom deposition (SA) is achieved by gas-phase scattering sputtering on various substrates. This method enables soft Pt single atom loading and uniform SA distribution. In the example, it is shown that how Pt SA loading on TiO₂ can be established and used for photocatalytic H₂ generation.

Supported single atoms represent a new frontier in many catalytic fields, and noble metal single atoms in particular have been reported to be a highly effective cocatalyst in photocatalysis or electrocatalysis. Herein, it is described that direct current sputtering of Pt, when operated under plain gas-scattering conditions, can be leveraged for single atom deposition on various substrates (herein TiO₂ and graphene are used as examples). The approach allows a uniform single atom deposition with a high level of control over single atom density and loading amount on both surfaces. Such Pt single atoms on TiO₂ can be used directly (without further treatments) as cocatalysts for photocatalytic H₂ generation. Remarkably, single atom loading and H₂ generation activity correlate linearly over a wide range of Pt loading (0.16–1.41 at%). The findings not only open a new avenue for the synthesis and use of single atoms in photocatalysis but also highlight the use of gas-phase scattering as a simple, scalable, and versatile approach for single-atom catalyst fabrication.

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