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Mesoporous Silica Supported Highly Dispersed GaN Catalysts Synthesized by Thermal Atomic Layer Deposition for Propane Dehydrogenation

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The Front Cover depicts the propane dehydrogenation (PDH) reaction on the supported gallium nitride (GaN) catalyst. In their Research Article, Hao Feng and co-workers report a novel method of synthesizing high surface area GaN catalysts supported on mesoporous silica (MCM-41) using thermal atomic layer deposition (ALD). GaN nanoparticles are uniformly dispersed on the surface of MCM-41 with ordered channel structures. Properties of highly dispersed GaN species were studied by various microscopic and spectroscopic techniques. In PDH reaction, the ALD GaN/MCM-41 catalysts demonstrated excellent activity and selectivity. More information can be found in the Research Article by Hao Feng and co-workers .


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